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@techreport{TUW-182337,
    author = {Beck, P and Hobler, Gerhard and K{\"o}ck, Anton and Rollet, S and Wachmann, E. and Wind, M},
    title = {{R}{A}{D}{S}{I} - {R}adiation {H}ardness of {S}ilicon {N}anostructures, {T}echnical final report},
    institution = {{E}362 - {I}nstitute of {S}olid {S}tate {E}lectronics; {V}ienna {U}niversity of {T}echnology},
    year = {2008}
}