H. Kirchauer, S. Selberherr:
"Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination";
Proceedings of SPIE, 3334 (1998), S. 764 - 776.
http://dx.doi.org/10.1117/12.310809Elektronische Version der Publikation:
http://www.iue.tuwien.ac.at/pdf/ib_1998/CP1998_Kirchauer_1.pdf