W. Pyka, H. Kirchauer, S. Selberherr:
"Three-Dimensional Resist Development Simulation - Benchmarks and Integration with Lithography";
Microelectronic Engineering, 53 (2000), 1-4; S. 449 - 452.
http://dx.doi.org/10.1016/S0167-9317(00)00353-1Elektronische Version der Publikation:
http://www.iue.tuwien.ac.at/pdf/ib_2001/JB2000_Pyka_1.pdf