N. Neophytou, H. Kosina:
"Hole Mobility Increase in Ultra-Narrow Si Channels under Strong (110) Surface Confinement";
Applied Physics Letters, 99 (2011), S. 092110-1 - 092110-3.
http://dx.doi.org/10.1063/1.3631680Elektronische Version der Publikation:
http://www.iue.tuwien.ac.at/pdf/ib_2011/JB2011_Neophytou_2.pdf