J. Ghosh, D. Osintsev, V. Sverdlov, S. Selberherr:
"Enhancement of Electron Spin Relaxation Time in Thin SOI Films by Spin Injection Orientation and Uniaxial Stress";
Journal of Nano Research, 39 (2016), S. 34 - 42.
http://dx.doi.org/10.4028/www.scientific.net/JNanoR.39.34Elektronische Version der Publikation:
http://www.iue.tuwien.ac.at/pdf/ib_2016/JB2016_ghosh_1.pdf