H. Puchner, S. Selberherr:
"An Advanced Model for Dopant Diffusion in Polysilicon";
IEEE Transactions on Electron Devices, 42 (1995), 10; 1750 - 1755.
http://dx.doi.org/10.1109/16.464423Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_1995/JB1995_Puchner_1.pdf