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@incollection{TUW-297933,
    author = {Aguinsky, Luiz Felipe and Wachter, Georg and Rodrigues, Francio and Scharinger, Alexander and Toifl, Alexander and Trupke, Michael and Schmid, Ulrich and H{\"o}ssinger, Andreas and Weinbub, Josef},
    title = {{Feature-Scale Modeling of Low-Bias SF{$_{6}$} Plasma Etching of Si}},
    booktitle = {{P}roceedings of the 2021 {J}oint {I}nternational {E}{U}{R}{O}{S}{O}{I} {W}orkshop and {I}nternational {C}onference on {U}ltimate {I}ntegration on {S}ilicon ({E}{U}{R}{O}{S}{O}{I}-{U}{L}{I}{S})},
    year = {2021},
    editor = {Cretu, Bogdan},
    pages = {1--4},
    publisher = {{I}{E}{E}{E}},
    url = {https://www.iue.tuwien.ac.at/pdf/ib_2021/BC2021_Aguinsky_1.pdf},
    doi = {10.1109/EuroSOI-ULIS53016.2021.9560685}
}



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