author = {Aguinsky, Luiz Felipe and Wachter, Georg and Scharinger, Alexander and Rodrigues, Francio and Toifl, Alexander and Trupke, Michael and Schmid, Ulrich and H{\"o}ssinger, Andreas and Weinbub, Josef},
    title = {{Feature-Scale Modeling of Isotropic SF{$_{6}$} Plasma Etching of Si}},
    booktitle = {{B}ook of {A}bstracts of the {J}oint {I}nternational {E}{U}{R}{O}{S}{O}{I} {W}orkshop and {I}nternational {C}onference on {U}ltimate {I}ntegration on {S}ilicon ({E}{U}{R}{O}{S}{O}{I}-{U}{L}{I}{S})},
    year = {2021},
    pages = {54--55},
    url = {https://www.iue.tuwien.ac.at/pdf/ib_2021/CP2021_Aguinsky_1.pdf},
    note = {poster presentation: {J}oint {I}nternational {E}{U}{R}{O}{S}{O}{I} {W}orkshop and {I}nternational {C}onference on {U}ltimate {I}ntegration on {S}ilicon ({E}{U}{R}{O}{S}{O}{I}-{U}{L}{I}{S}), {C}aen, {F}rance; 2021-09-01 -- 2021-09-03}

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