[Back]

@inproceedings{TUW-302978,
    author = {Franco, J. and Marneffe, J.-F. and Vandooren, Anne and Kimura, Y and Nyns, L and Wu, Zhicheng and El-Sayed, Al-Moatasem and Jech, Markus and Waldh{\"o}r, Dominic and Claes, Dieter and Arimura, H and Ragnarsson, L. A. and Afanas'Ev, V. and Horiguchi, N. and Linten, D and Grasser, Tibor and Kaczer, Ben},
    title = {{Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO{$_{2}$} with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking}},
    booktitle = {{P}roceedings of the {I}{E}{E}{E} {I}nternational {E}lectron {D}evices {M}eeting ({I}{E}{D}{M})},
    year = {2021},
    pages = {31.2.1--31.2.4},
    url = {https://www.iue.tuwien.ac.at/pdf/ib_2021/CP2021_Grasser_2.pdf},
    isbn = {978-1-7281-8888-1},
    doi = {10.1109/IEDM13553.2020.9372054},
    note = {talk: {I}{E}{E}{E} {I}nternational {E}lectron {D}evices {M}eeting ({I}{E}{D}{M}), {S}an {F}rancisco, {C}{A}, {U}{S}{A}; 2021-12-12 -- 2021-12-18}
}



Created from the Publication Database of the Vienna University of Technology.