Vorträge und Posterpräsentationen (mit Tagungsband-Eintrag):
T. Fellner, W. Smetana, H. Hauser, J. Nicolics:
"Properties of Low K Thick Film Dielectrics";
Poster: International Spring Seminar on Electronics Technology (ISSE),
Dresden, Germany;
18.05.1999
- 20.05.1999; in: "Proc. of ISSE 99",
(1999),
ISBN: 3-934142-00-1;
S. 382
- 385.
Kurzfassung englisch:
Capacitance and dissipation factor as a function of temperature and frequency are investigated. Sample capacitors have been prepared employing different combinations of thick film conductor and dielectric inks. Wide frequency dispersion and significant interaction between temperature and frequency dependence have been observed, which may be attributed to the highly disordered microstructure of the dielectric layers and to thermally activated polarization and conductivity, respectively. It is shown that measured data may be described by a model calculating a superposition of relaxation and conduction effects.
Erstellt aus der Publikationsdatenbank der Technischen Universität Wien.