Publications in Scientific Journals:
H. Kirchauer, S. Selberherr:
"Rigorous Three-Dimensional Photoresist Exposure and Development Simulation over Nonplanar Topography";
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems,
16
(1997),
12;
1431
- 1438.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/43.664225
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_1998/JB1997_Kirchauer_1.pdf
Created from the Publication Database of the Vienna University of Technology.