Publications in Scientific Journals:
W. Bohmayr, A. Burenkov, J. Lorenz, H. Ryssel, S. Selberherr:
"Monte Carlo Simulation of Silicon Amorphization during Ion Implantation";
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems,
17
(1998),
12;
1236
- 1243.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/43.736563
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_1999/JB1998_Bohmayr_1.pdf
Created from the Publication Database of the Vienna University of Technology.