Talks and Poster Presentations (with Proceedings-Entry):
W. Bohmayr, A. Burenkov, J. Lorenz, H. Ryssel, S. Selberherr:
"Monte Carlo Simulation of Silicon Amorphization During Ion Implantation";
Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Tokyo, Japan;
1996-09-02
- 1996-09-04; in: "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)",
(1996),
ISBN: 0-7803-2745-4;
17
- 18.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/SISPAD.1996.865252
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_1997/CP1996_Bohmayr_1.pdf
Created from the Publication Database of the Vienna University of Technology.