Publications in Scientific Journals:
H. Kirchauer, S. Selberherr:
"Three-Dimensional Photolithography Simulator Including Rigorous Nonplanar Exposure Simulation for Off-Axis Illumination";
Proceedings of SPIE,
3334
(1998),
764
- 776.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1117/12.310809
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_1998/CP1998_Kirchauer_1.pdf
Created from the Publication Database of the Vienna University of Technology.