Publications in Scientific Journals:
W. Pyka, H. Kirchauer, S. Selberherr:
"Three-Dimensional Resist Development Simulation - Benchmarks and Integration with Lithography";
Microelectronic Engineering,
53
(2000),
1-4;
449
- 452.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1016/S0167-9317(00)00353-1
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2001/JB2000_Pyka_1.pdf
Created from the Publication Database of the Vienna University of Technology.