Publications in Scientific Journals:
C. Heitzinger, W. Pyka, N. Tamaoki, T. Takase, T. Ohmine, S. Selberherr:
"Simulation of Arsenic In Situ Doping With Polysilicon CVD and Its Application to High Aspect Ratio Trenches";
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems,
22
(2003),
3;
285
- 292.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/TCAD.2002.807879
Online library catalogue of the TU Vienna:
http://aleph.ub.tuwien.ac.at/F?base=tuw01&func=find-c&ccl_term=AC04403654
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2003/JB2003_Heitzinger_1.pdf
Created from the Publication Database of the Vienna University of Technology.