Talks and Poster Presentations (with Proceedings-Entry):
R. Wittmann, A. Hössinger, S. Selberherr:
"Monte Carlo Simulation of Ion Implantation in Silicon-Germanium Alloys";
Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Munich, Germany;
2004-09-02
- 2004-09-04; in: "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)",
Springer,
(2004),
ISBN: 3211224688;
169
- 172.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1007/978-3-7091-0624-2_40
Online library catalogue of the TU Vienna:
http://aleph.ub.tuwien.ac.at/F?base=tuw01&func=find-c&ccl_term=AC04967635
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2005/CP2004_Wittmann_1.pdf
Related Projects:
Project Head Siegfried Selberherr:
SIM
Created from the Publication Database of the Vienna University of Technology.