Contributions to Books:
R. Wittmann, S. Uppal, A. Hössinger, J. Cervenka, S. Selberherr:
"A Study of Boron Implantation into High Ge Content SiGe Alloys";
in: "SiGe and Ge: Materials, Processing, and Devices, Vol. 3, No. 7",
D. Harame, J. Boquet, M. Caymax, J. Cressler, H. Iwai, S. Koester, G. Masini, J. Murota, A. Reznicek, K. Rim, B. Tillack, S. Zaima (ed.);
issued by: The Electrochemical Society;
ECS Transactions,
2006,
ISBN: 1-56677-507-8,
667
- 676.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1149/1.2355862
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2007/JB2006_Wittmann_1.pdf
Created from the Publication Database of the Vienna University of Technology.