Publications in Scientific Journals:

S. Shaikhutdinov, M. Heemeier, J. Hoffmann, I. Meusel, B. Richter, M. Bäumer, H. Kuhlenbeck, J. Libuda, H. Freund, R. Oldman, S.D. Jackson, C. Konvicka, M. Schmid, P. Varga:
"Interaction of oxygen with palladium deposited on a thin alumina film";
Surface Science, 501 (2002), 270 - 281.

English abstract:
The interaction of oxygen with Pd particles, vapor deposited onto a thin alumina film grown on a NiAl(110) substrate, was studied by STM, AES,
LEED, XPS, TPD and molecular beam techniques. The results show that O2 exposure at 400-500 K strongly influences the oxide support. We
suggest that the oxygen atoms formed by dissociation on the Pd surface can diffuse through the alumina film and react with the NiAl substrate
underneath the Pd particles, thus increasing the thickness of the oxide film. The surface oxygen inhibits hydrogen adsorption, and readily reacts
with CO at 300-500 K. For large and crystalline Pd particles, the system exhibits adsorption-desorption properties which are very similar to
those of the Pd(111) single crystal surface. The molecular beam and TPD experiments reveal that, at low coverage, CO adsorbs slightly stronger
on the smaller Pd particles, with an adsorption energy difference of ca. = 5-7 kJmol-1 for 1 and 3-5 nm Pd particles studied.

Electronic version of the publication:

Created from the Publication Database of the Vienna University of Technology.