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W.S.M. Werner, L. Köver, J. Tóth:
"Line shape analysis of high energy X-ray induced Auger- andphotoelectron spectra of thin Cu and Ni films";
Journal of Electron Spectroscopy and Related Phenomena, 122 (2002), 103 - 114.

A detailed study of the line shape of high energy Cu X-rays excited Auger- and photoelectron spectra of layered samples
is presented. The samples consisted of polycrystalline Cu and Ni overlayers of various thicknesses deposited on a Si
substrate. The raw data show that the contribution caused by bulk inelastic scattering in the spectra increases significantly
with overlayer thickness. Employing a general deconvolution procedure, the contribution of bulk inelastic scattering was
consistently eliminated. The resulting spectra are in excellent agreement. The contribution caused by surface excitations has
a very moderate effect at these high energies, while intrinsic losses were estimated to make up |30-50% of the total
intensity. The true energy distribution at the source as seen by the spectrometer was established by elimination of the
features due to surface excitations and the contribution from intrinsic excitations of the delocalized electronic states was
determined. Ó 2002 Elsevier Science B.V. All rights reserved.