Publications in Scientific Journals:

I. Gebeshuber, S. Cernusca, F. Aumayr, Hp. Winter:
"Nanoscopic surface modification by slow ion bombardment";
International Journal of Mass Spectrometry, 229 (2003), 27 - 34.

English abstract:
We present systematic STM-/AFM investigations on nanoscopic defect production at atomically clean surfaces of SiO2, Al2O3 and highly-oriented pyrolytic graphite (HOPG) after bombardment by slow (impact energy equal/less 1.2 keV) singly and multiply charged ions under strict UHV conditions. Combined STM- and AFM studies show that on HOPG only "electronic" but no visible topographic defects are created by such ion bombardment. On the monocrystalline insulator surfaces well defined topographic features of typically nm extensions are produced ("potential sputtering"). For Al2O3 and HOPG a clear dependence of the defect size on the projectile ion charge is demonstrated. These results are discussed in view to possible new nanoscopic surface structuring and -modification methods for which the kinetic projectile energy plays a minor role only.

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