Publications in Scientific Journals:

J. Gustafson, A. Mikkelsen, M. Borg, E. Lundgren, L. Köhler, G. Kresse, M. Schmid, P. Varga, J. Yuhara, X. Torrelles, C. Quirós, J.N. Andersen:
"Self-Limited Growth of a Thin Oxide Layer on Rh(111)";
Physical Review Letters, 92 (2004), 12; 126102-1 - 126102-4.

English abstract:
The oxidation of the Rh(111) surface at oxygen pressures from 10-10 mbar to 0.5 bar and temperatures between 300 and 900 K
has been studied on the atomic scale using a multi-method approach of experimental and theoretical techniques. Oxidation starts
at the steps, resulting in a trilayer O-Rh-O surface oxide, which, although not thermodynamically stable, prevents further
oxidation at intermediate pressures. A thick corundum-like Rh2O3 bulk oxide is only formed at significantly higher pressures and

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