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H. Schiechl:
"Pulsed Laser Deposition of ultrathin Fe films";
Vortrag: Seminar Institut für Allgemeine Physik (IAP), TU Wien; 31.05.2005.

Pulsed Laser Deposition (PLD) is a method for growing thin films, with increasing industrial and scientific relevance. Compared to thermal deposition (TD), this method has several advantages, like enhanced layer-by-layer growth, even for metal-on-metal systems. The reasons for the different properties (growth mode, structure, magnetic properties) of PLD films are the subject of ongoing discussion.
We have investigated the growth of ultrathin (< 10 ML) Fe films on Cu(111) and Cu(100), using scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS) and low-energy ion scattering (LEIS). PLD-grown films can show different structure, composition, and for films on Cu(111) a distinctly different growth mode compared to TD-grown films. Besides resolving the atomic structure, which is the basis for understanding of the magnetic properties of these films, we also elucidate the underlying processes of PLD film growth by finding the reason for enhanced layer-by-layer growth of the system Fe/Cu(111).