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B. Schwarz, C. Eisenmenger-Sittner, H. Steiner:
"CONSTRUCTION OF A HIGH TEMPERATURE SESSILE DROP DEVICE";
Poster: 11th Joint Vacuum Conference (JVC 11), Prag / Tschechische Republik; 24.09.2006 - 28.09.2006.

CONSTRUCTION OF A HIGH TEMPERATURE SESSILE DROP DEVICE

B. Schwarz*, C. Eisenmenger-Sittner, H. Steiner
Vienna University of Technology, Institute of Solid State Physics E-138
Wiedner Hauptstraße 8-10, A-1040 Vienna, Austria

Abstract:

The study of the wettability in a liquid metal - solid surface system is of great technological interest for industrial processes like soldering and brazing as well as for fundamental research in the field of diffusion, chemical reaction and formation of intermetallic phases.
For the characterization of these processes the so-called contact angle between the molten droplet and the substrate is measured. Therefore a high temperature sessile drop device was planned and constructed. It consists of a vacuum chamber, pumped by a turbomolecular pump with a base pressure of 5 × 10-7 mbar. The heating of the samples up to approx. 1100°C is realized by a water cooled resistance heated substrate holder with a Ta-foil onto which the substrate is placed. This substrate holder can also be inserted into several PVD plants in which wetting promoting coatings are deposited. The delivery of the metal for the droplet is done by a manipulator, which allows the positioning of the metal onto the substrate after inserting it into the vacuum. The contact angle is determined by an optical system connected to a PC via a webcam. Software for an automatic measurement of the contact angle is available.