Publications in Scientific Journals:

S. Pahlke, F. Meirer, P. Wobrauschek, C. Streli, G. P. Westphal, M. Mantler:
"Adaptation of a commercial total reflection X-ray fluorescence system for wafer surface analysis equipped with a new generation of silicon drift detector";
Spectrochimica Acta Part B, 61 (2006), 1110 - 1114.

English abstract:
Within the framework of a collaborative project, it is shown that commercial total reflection X-ray fluorescence (TXRF) systems used in
laboratories can easily be upgraded with a silicon drift detector (SDD). SDDs have advantages when used with fully automatized wafer analyzers
working under cleanroom conditions, because no liquid nitrogen is required as they are electrically cooled. The goal of this work was the
integration of a KETEK 10 mm2 SDD in an ATOMIKA 8030W wafer analyzer with special attention to maintain the high degree of automation of
the system. An electronic device was designed to establish communication between the SDD and the TXRF electronic control system. The
adapted system was tested and compared with the original setup using an 80 mm2 Si(Li) detector. Multielement droplet samples on silicon wafers
were analyzed and the results showed two times better detection limits for the Si(Li) detector for 1000 pg Ni in comparison to the SDD.
Additionally, a RADIANT 50 mm2 SDD (VORTEX) was tested which showed identical detection limits compared to the 80 mm2 Si(Li) detector.
2006 Elsevier B.V. All rights reserved.

Online library catalogue of the TU Vienna:

Created from the Publication Database of the Vienna University of Technology.