Patents:
D. Doshi, H. Fan, N. Hüsing, A. Hurd, C. Brinker:
"Photo-definable self-assembled materials";
Patent: United States,
No. 0020127498 A1;
submitted: 2002-03-19.
English abstract:
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.
Created from the Publication Database of the Vienna University of Technology.