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Vorträge und Posterpräsentationen (ohne Tagungsband-Eintrag):

C. Eisenmenger-Sittner, M. Horkel, K. VanAeken, S. Mahieu, D. Depla:
"Angular Resolved Determination Of The Particle Flux Towards A Substrate For Magnetron Sputteruing";
Vortrag: 14th International Conference on Thin Films & Reactive Sputter Deposition, Ghent, Belgien; 17.11.2008 - 20.11.2008.



Kurzfassung englisch:
Magnetron sputtering offers a wide range of deposition parameters because of the free choice of target parameters and due to the possibility to tune the angular and energy distribution of the ejected particles by variation of the working gas pressure. In addition reactive working gases may be chosen to allow the formation of compound materials.
This paper focuses on the experimental determination of the angular distribution of metallic sputtered particles upon impingement on a substrate and on the comparison of these experiments with Monte Carlo simulations of the gas phase transport.
For the experiments a special Metal Flux Monitor (MFM) based upon the principle of a differentially pumped pinhole camera was designed. The particles are collected either on transparent or highly reflecting plane substrates and the film thickness is determined spatially resolved by optical methods.
The metals chosen were Cu and W as examples for non reactive materials with different masses and Al as a metal highly inclined to oxide formation. The distance target to pinhole was kept constant at approx. 95 mm and Ar with pressures in the range from 0.3 - 3 Pa was chosen as working gas.
Cu and W formed thin metallic coatings, while in the case of Al the oxygen background pressure was sufficient of lead to the formation of transparent Aluminium Oxide. The experimentally determined film thicknesses and Monte Carlo Simulations showed very good agreement in both cases, metallic and oxidic coatings. Therefore both, the experimental and the simulation technique can be extended to the more complex case of the deposition from different sputter sources and also to the intentional introduction of reactive gases, thus allowing for the formation of compound materials using different reactive gases.
The financial support of the IWT Flanders, Grant No. SBO 060030 is gratefully acknowledged.

Erstellt aus der Publikationsdatenbank der Technischen Universität Wien.