Talks and Poster Presentations (with Proceedings-Entry):
N. Adamovic, J. Matovic, J. Kettle, E. Brousseau:
"Patterning of Nanomembranes with a Focused-Ion-Beam";
Poster: 26th International Conference on Microelectronics 2008,
Nis, Serbien;
05-11-2008
- 05-14-2008; in: "Proceedings",
IEEE,
IEEE Catalog No. CFP08432
(2008),
ISBN: 978-1-4244-1882-4;
103
- 106.
English abstract:
A nanomembrane is a new MEMS/NEMS structural component. Most nanomembrane structures consist of a free-standing element, with a mean thickness between 5 and 30 nm. In contrast to its thickness, the lateral dimensions of a nanomembrane are in the range of 3 to 5 mm. In this paper, the fabrication of a new type of nanomembranes with a thickness of approximately 20 atomic layers and with a large area is presented. In addition, this study demonstrates that Focused-Ion Beam (FIB) can be applied successfully to the patterning of such nanomembranes.
Related Projects:
Project Head Nadja Adamovic:
Innovative Generation von Protonen-Austausch-Membran-Brennstoffzellen (PEMFC) unter Einsatz von Nanomembran-Funktionsgruppen
Created from the Publication Database of the Vienna University of Technology.