Talks and Poster Presentations (with Proceedings-Entry):
N. Neophytou, H. Kosina, S. Selberherr, G. Klimeck:
"Dependence of Injection Velocity and Capacitance of Si Nanowires on Diameter, Orientation, and Gate Bias: An Atomistic Tight-Binding Study";
Talk: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
San Diego, CA, USA;
2009-09-09
- 2009-09-11; in: "Proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)",
(2009),
ISBN: 978-1-4244-3947-8;
71
- 74.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/SISPAD.2009.5290245
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2009/CP2009_Neophytou_2.pdf
Created from the Publication Database of the Vienna University of Technology.