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C. Eisenmenger-Sittner, M. Horkel, K. VanAeken, S. Mahieu, E. Leroy, D. Depla:
"Experimental and theoretical determination of the particle flux for magnetron sputtering";
Vortrag: IUVSTA Highlight Seminar, Urbana, Illinois, USA; 20.04.2009 - 21.04.2009.

Magnetron Sputtering offers the possibility to tune the angular and energy distribution of the ejected particles by a variation of the working gas pressure. Also the geometry of the racetrack and the target geometry play a decisive role. In addition reactive working gases may be chosen to allow for the formation of compound materials.
This paper focuses on the experimental determination of the angular distribution of metallic sputtered particles upon impingement on a substrate. The experimental data are compared with the results of Monte Carlo simulations using the user friendly software SIMTRA developed at the Ghent University.
For the experiments a special Metal Flux Monitor (MFM) based upon the principle of a differentially pumped pinhole camera was designed. The particles are collected on a transparent flexible collector. The film thickness is determined spatially resolved by optical methods.
Cu was chosen as an example for non-reactive deposition by magnetron sputtering from a planar 2" target. Ar was used as the working gas. The distance between target and pinhole was varied in the range from 25 mm to 100 mm, Ar pressures ranged from 0.3 - 1 Pa.
The experimentally determined film thicknesses and Monte Carlo Simulations show very good agreement.
The SIMTRA code was also applied to treat the case of a cylindrical rotatable magnetron. Experiments using a freely positionable Quartz Microbalance (QMB) also showed very good agreement between experimental results and the data retrieved from the SIMTRA code. As a consequence predictions for MFM experiments using rotatable magnetrons will be discussed in the final part of this presentation.
The financial support of the IWT Flanders, Grant No. SBO 060030 is gratefully acknowledged.