Zeitschriftenartikel:
O. Yermolenko, G. Kornich, G. Betz:
"Molecular dynamics simulations of low-energy argon ion sputtering of copper clusters on polyethylene surfaces";
Nuclear Instruments & Methods in Physics Research Section B,
269
(2011),
S. 1604
- 1608.
Kurzfassung englisch:
The normal bombardment of the targets consisted of single 13-, 27- or 39-atom copper cluster on a
surface of polyethylene by Ar ions with energies of 100, 200 and 400 eV is examined using molecular
dynamics simulation incorporating long-range many-body covalent bonding potential for hydrocarbons
and a potential based on a embedded atom model for copper. Sputtering yield and its dependence on the
energy of bombarding ion and size of the pre-deposited copper cluster are discussed.
Schlagworte:
Clusters Polyethylene Ion bombardment Sputtering Molecular dynamics
Erstellt aus der Publikationsdatenbank der Technischen Universität Wien.