Vorträge und Posterpräsentationen (mit Tagungsband-Eintrag):
M Junk, F Holsteyns, F. Staudegger, Ch. Lechner, H.C. Kuhlmann, D. Prieling, H. Steiner, B. Gschaider:
"Simulations Of Liquid Film Flows With Free Surface On Rotating Silicon Wafers (RoWaFlowSim)";
Vortrag: 10th International Conference on Modeling and Applied Simulation (MAS2011),
Rom;
12.09.2011
- 14.09.2011; in: "Proceedings of the 10th International Conference on Modeling and Applied Simulation, MAS 2011",
Universitá di Genova, Genova,
(2011),
ISBN: 978-88-903724-5-2.
Kurzfassung englisch:
For application in the semi-conductor industries, the flow on a rotating disk (wafer) is studied numerically. A systematic validation of available variations of the Volume-of-Fluid (VoF) scheme for this two-phase flow problem is done. To make larger parameter variations of this problem with a moving fluid supply possible, a code based on the thin-film approximation is developed. To better understand possible physical mechanisms for the removal of nano-particulate contaminations from a wafer, another code to study the detachment of submicron particles exposed to shear flows is developed and validated. An immersed boundary method with direct forcing is implemented. The particle-wall interaction is treated with a soft contact model.
Schlagworte:
two-phase flow, thin-film approximation, particle removal, immersed boundary method
Erstellt aus der Publikationsdatenbank der Technischen Universität Wien.