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M Junk, F Holsteyns, F. Staudegger, Ch. Lechner, H.C. Kuhlmann, D. Prieling, H. Steiner, B. Gschaider:
"Simulations Of Liquid Film Flows With Free Surface On Rotating Silicon Wafers (RoWaFlowSim)";
Talk: 10th International Conference on Modeling and Applied Simulation (MAS2011), Rom; 2011-09-12 - 2011-09-14; in: "Proceedings of the 10th International Conference on Modeling and Applied Simulation, MAS 2011", Universitá di Genova, Genova, (2011), ISBN: 978-88-903724-5-2.

For application in the semi-conductor industries, the flow on a rotating disk (wafer) is studied numerically. A systematic validation of available variations of the Volume-of-Fluid (VoF) scheme for this two-phase flow problem is done. To make larger parameter variations of this problem with a moving fluid supply possible, a code based on the thin-film approximation is developed. To better understand possible physical mechanisms for the removal of nano-particulate contaminations from a wafer, another code to study the detachment of submicron particles exposed to shear flows is developed and validated. An immersed boundary method with direct forcing is implemented. The particle-wall interaction is treated with a soft contact model.

two-phase flow, thin-film approximation, particle removal, immersed boundary method