Talks and Poster Presentations (with Proceedings-Entry):
S. E. Tyaginov, I. Starkov, O. Triebl, M. Karner, C. Kernstock, C. Jungemann, H. Enichlmair, J.M. Park, T. Grasser:
"Impact of Gate Oxide Thickness Variations on Hot-Carrier Degradation";
Poster: IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA),
Singapore;
2012-07-02
- 2012-07-06; in: "Proceedings of the 19th International Symposium on the Physical & Failure Analysis of Integrated Circuits",
(2012),
ISBN: 978-1-4673-0980-6;
1
- 5.
"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/IPFA.2012.6306265
Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2012/CP2012_Starkov_7.pdf
Created from the Publication Database of the Vienna University of Technology.