[Zurück]

M. Bartosik, R. Daniel, C. Mitterer, I. Matko, M. Burghammer, P.H. Mayrhofer, J. Keckes:
"Cross-sectional X-ray nanobeam diffraction analysis of a compositionally graded CrN_x thin film";
Thin Solid Films, 542 (2013), S. 1 - 4.

Synchrotron X-ray nanodiffraction is used for the position-resolved characterization of a nanocrystalline graded CrN_x thin film deposited with continuously increasing nitrogen content over the 6 μm film thickness. The diffraction experiment is performed in wide angle X-ray scattering transmission geometry using a monochromatic beam of 100 nm in diameter. The results reveal a complex microstructure and texture evolution in hexagonal Cr₂N and cubic CrN_x phases as well as a compressive strain increase in CrN_x towards the film surface.

X-ray Nanodiffraction; Nanobeam; Residual strain; Chromium Nitride; Transmission Electron Microscopy

http://dx.doi.org/10.1016/j.tsf.2013.05.102