[Back]


Publications in Scientific Journals:

J. Franco, B. Kaczer, J. Mitard, M. Toledano-Luque, Ph. J. Roussel, L. Witters, T. Grasser, G Groeseneken:
"NBTI Reliability of SiGe and Ge Channel pMOSFETs With SiO2/HfO2 Dielectric Stack";
IEEE Transactions on Device and Materials Reliability (invited), 13 (2013), 4; 497 - 506.



"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1109/TDMR.2013.2281731

Electronic version of the publication:
http://www.iue.tuwien.ac.at/pdf/ib_2013/JB2014_Grasser_2.pdf


Created from the Publication Database of the Vienna University of Technology.