R. Saathof, J. Spronck, R. M. Schmidt:
"Design of an AM for EUV lithography";
Mikroniek, 54 (2014), 3; S. 11 - 14.

Kurzfassung englisch:
The high absorption of extreme ultraviolet (EUV) light causes thermal
deformation of the mirrors in an EUV lithography machine, which in
turn distorts the wavefront. This distortion deteriorates the imaging
process in lithography. An adaptive optics correction strategy for
counteracting these wavefront errors with sub-nm precision is studied.
To achieve this precision, an active mirror (AM) is designed and
validated in an experimental set-up. A comparison is presented between
modelling and experimental results, as well as a feasibility experiment
for PI control of the AM.

Elektronische Version der Publikation:

Erstellt aus der Publikationsdatenbank der Technischen Universitšt Wien.