Talks and Poster Presentations (with Proceedings-Entry):
R. Saathof, J. Spronck, R. Munnig Schmidt:
"Counteracting Thermal Issues in EUV-Lithography using an Adaptive Optics System";
Talk: EUSPEN Special Interest Group: Thermal Issues,
Zürich, Schweiz;
03-19-2014
- 03-20-2014; in: "Proceeding of the EUSPEN Special Interest Group: Thermal Issues",
(2014),
ISBN: 978-0-9566790-4-8;
2 pages.
English abstract:
The high absorption of Exreme UltraViolet (EUV)-light deteriorates the imaging process of EUV-lithography machines. In this study a correction strategy and mechanisms are presented including experimental results.
Created from the Publication Database of the Vienna University of Technology.