Talks and Poster Presentations (with Proceedings-Entry):

R. Saathof, J. Spronck, R. Munnig Schmidt:
"Counteracting Thermal Issues in EUV-Lithography using an Adaptive Optics System";
Talk: EUSPEN Special Interest Group: Thermal Issues, Zürich, Schweiz; 03-19-2014 - 03-20-2014; in: "Proceeding of the EUSPEN Special Interest Group: Thermal Issues", (2014), ISBN: 978-0-9566790-4-8; 2 pages.

English abstract:
The high absorption of Exreme UltraViolet (EUV)-light deteriorates the imaging process of EUV-lithography machines. In this study a correction strategy and mechanisms are presented including experimental results.

Created from the Publication Database of the Vienna University of Technology.