Talks and Poster Presentations (with Proceedings-Entry):
L Stöber, J. Konrath, M. Schneider, U. Schmid:
"Usability of Molybdenum and Molybdenum Nitride Thin Films for Microsystem Applications";
Talk: MME 2014 - 25th Micromechanics and Microsystems Europe workshop,
Istanbul, Türkei;
08-31-2014
- 09-03-2014; in: "MME 2014 - 25th Micromechanics and Microsystems Europe workshop",
(2014),
1
- 4.
English abstract:
In this paper we present a study on
the usability of sputter-deposited molybdenum and
molybdenum nitride thin films for microsystem
applications. The influence of the deposition parame-
ters on the deposition rate is investigated and the
surface-related microstructure is analyzed using an
atomic force microscope. For device integration
purposes, patterning is performed using reactive ion
etching, whereby the best results were achieved
using tetrafluoromethane (CF4).
German abstract:
In this paper we present a study on
the usability of sputter-deposited molybdenum and
molybdenum nitride thin films for microsystem
applications. The influence of the deposition parame-
ters on the deposition rate is investigated and the
surface-related microstructure is analyzed using an
atomic force microscope. For device integration
purposes, patterning is performed using reactive ion
etching, whereby the best results were achieved
using tetrafluoromethane (CF4).
Keywords:
molybdenum, molybdenum nitride, reactive sputter deposition, reactive ion etching, atomic force microscope
Related Projects:
Project Head Ulrich Schmid:
Mikrosystemtechnik Projektkonto Schmid
Created from the Publication Database of the Vienna University of Technology.