Talks and Poster Presentations (with Proceedings-Entry):
A Talai, F. Steinhäußer, B Gmeiner, M. Wegener, A. Bittner, U. Schmid, A. Roosen, R. Weigel, K. Kölpin:
"Electromagnetic Analysis of Conductor Track Surface Roughnesses from 1 GHz to 110 GHz";
Talk: International Conference on Electromagnetics in Advanced Applications (ICEAA),
Palm Beach, Aruba;
2014-08-03
- 2014-08-08; in: "Proceedings of the 2014 International Conference on Electromagnetics in Advanced Applications (ICEAA)",
IEEE,
(2014),
ISBN: 978-1-4673-5710-4;
415
- 418.
English abstract:
Conductor tracks comprise a frequency
dependent attenuation of electromagnetic waves,
since with increasing frequency the current flow is
displaced to the near surface region due to the skin
effect. Therefore, the effective length of the con
ductor is increased by the surface roughness, while
its effective cross-section is decreased by current
displacement, both leading to higher metallization
loss. In this paper, surface topographies of typi
cal conductor materials were recorded by confocal
microscopy and rebuilt as 3D CAD models. Sub
sequent electromagnetic simulations reveal the in
fluence due to roughness on high frequency charac
teristics for physical vapor deposited, thick film and
photochemically etched microstrips.
German abstract:
Conductor tracks comprise a frequency
dependent attenuation of electromagnetic waves,
since with increasing frequency the current flow is
displaced to the near surface region due to the skin
effect. Therefore, the effective length of the con
ductor is increased by the surface roughness, while
its effective cross-section is decreased by current
displacement, both leading to higher metallization
loss. In this paper, surface topographies of typi
cal conductor materials were recorded by confocal
microscopy and rebuilt as 3D CAD models. Sub
sequent electromagnetic simulations reveal the in
fluence due to roughness on high frequency charac
teristics for physical vapor deposited, thick film and
photochemically etched microstrips.
Created from the Publication Database of the Vienna University of Technology.