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Publications in Scientific Journals:

M. Bartosik, M. Arndt, R. Rachbauer, C. Krywka, C.M. Koller, J. Keckes, P.H. Mayrhofer:
"Cross-sectional X-ray nano-diffraction and -reflectivity analysis of multilayered AlTiN-TiSiN thin films: Correlation between residual strain and bi-layer period";
Scripta Materialia, 107 (2015), 153 - 156.



English abstract:
A multi-layered AlTiN-TiSiN thin film with a bi-layer period of ∼6 nm is characterized by cross-sectional synchrotron X-ray nano-diffraction and -reflectivity using an X-ray beam size of 250 350 nm^2. The complementary approach allows for simultaneous determining gradients of residual strains and bi-layer thickness along the film depth and demonstrates a correlation between them. The observed dependency allows for a residual strain gradient design in multilayered thin films.

Keywords:
Bi-layer period; Multilayer; Nanobeam; Residual strain; TiSiN/AlTiN


"Official" electronic version of the publication (accessed through its Digital Object Identifier - DOI)
http://dx.doi.org/10.1016/j.scriptamat.2015.06.008


Created from the Publication Database of the Vienna University of Technology.