Vorträge und Posterpräsentationen (mit Tagungsband-Eintrag):
C. Gorsche, P. Knaack, D. Bomze, K. Seidler, P. Gauss, M. Griesser, I. Krossing, T. Koch, N. Moszner, R. Liska:
"Toughening of Radical Photopolymer Networks and Advances in Cationic Photopolymerization";
Vortrag: Noblelight UV Technical Seminar 2016,
Tokio;
22.04.2016; in: "21st Noblelight UV Technical Seminar",
21st Noblelight UV Technical Seminar-proceedings,
(2016),
S. 05.
Kurzfassung englisch:
For acrylate-based photopolymerization the fabrication of bulk materials is receiving increasing attention. Major drawbacks of bulk photopolymers are brittleness and high shrinkage stress which both result from the rapid radical curing process.1 In order to improve said shortcomings the polymerization mechanism needs to be altered which can be successfully achieved via chain transfer reactions (e.g. thiol-ene chemistry,2 addition fragmentation chain transfer (AFCT) reagents3). β-Ally sulfones4, 5 and vinyl sulfone esters6 show great promise as AFCT reagents for acrylate-based photopolymerization thus paving the way to materials with low shrinkage stress and high toughness.
Schlagworte:
Radical Photopolymerization, Network Regulation, Dental Materials, Stereolithography
Erstellt aus der Publikationsdatenbank der Technischen Universität Wien.