Talks and Poster Presentations (with Proceedings-Entry):

C. Gorsche, K. Seidler, H. Reghunathan, P. Gauss, M. Kury, P. Dorfinger, T. Koch, J. Stampfl, N. Moszner, R. Liska:
"Addition fragmentation chain transfer: Enriching the field of photopolymer applications";
Talk: 4th European Symposium of Photopolymer Science, Leipzig; 09-11-2016 - 09-14-2016; in: "ESPS 2016", (2016), O-7.

English abstract:
(Meth)acrylate-based resins make up the base materials for photopolymer applications. With the expansion towards many advanced technologies (e.g. tissue engineering, 3D structuring, nanoimprint lithography, dental medicine, frontal polymerization), an increasing demand for innovative materials has surfaced. In photopolymer chemistry, the radical chain growth curing mechanism initiated by light leads to highly irregular polymer structures that exhibit shrinkage stress upon gelation. As a result, such materials often suffer from poor toughness and crack failure.[1] In order to make those materials suitable for a wider spectrum of applications, strategies to regulate the radical curing process have been developed (e.g. thiol-ene chemistry[2]).
We have found addition fragmentation chain transfer (AFCT) reagents[3] to be a powerful tool for the regulation of radical photocuring and tuning of thermo-mechanical properties.[4] Suitable AFCT reagents for (meth)acrylate-based resins can be established by modifying leaving[5] or activating[6] groups and also by changing the functionality of said reagents[7]. Compared to standard (meth)acrylate-based materials, the presented regulated polymers exhibit higher overall conversion, less shrinkage stress and higher impact resistance while maintaining high moduli and good photoreactivity. First application oriented tests outline the potential of such photopolymers for lithography-based 3D structuring[8] and dental medicine.

Addition fragmentation chain transfer, photopolymers, tissue engineering, 3D structuring, nanoimprint lithography, dental medicine, frontal polymerization

Created from the Publication Database of the Vienna University of Technology.