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P. Polcik, S. Koloszvári, H. Riedl, P.H. Mayrhofer:
"Sputter target and method for producing a sputter target";
Patent: USA, No. 16489435; submitted: 2017-03-10, granted: 2019-12-05.

A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.