[Zurück]

M. Shawrav, M.-H. Chien, P. Taus, E. Bertagnolli, H. D. Wanzenböck, S. Schmid:
"An overview of in - situ and ex - situ purification strategies for FEBID gold nanostructures";
Vortrag: CELINA, Porto, Portugal (eingeladen); 16.09.2017; in: "4th annual meeting of the Chemistry for Electron-Induced Nanofabrication (CELINA), COST Action CM1301", (2017), S. 29.

Focused Electron Beam Induced Deposition (FEBID) is a direct-write nanofabrication technique where metals can be deposited in-situ in single process step. A gas injection system (GIS) is used to insert the precursor molecule inside the chamber. Among various FEBID materials, gold has received attention due to its applications in plasmonics. FEBID gold has already been utilized to fabricate MOS Capacitors and plasmonics based devices. However low metal content on the deposits hampers the performance of the fabricated structures. This work will give an overview of various in-situ and ex-situ purification approaches which can increase the metal content of noble metal nanostructures.

Focused Electron Beam Induced Deposition (FEBID) is a direct-write nanofabrication technique where metals can be deposited in-situ in single process step. A gas injection system (GIS) is used to insert the precursor molecule inside the chamber. Among various FEBID materials, gold has received attention due to its applications in plasmonics. FEBID gold has already been utilized to fabricate MOS Capacitors and plasmonics based devices. However low metal content on the deposits hampers the performance of the fabricated structures. This work will give an overview of various in-situ and ex-situ purification approaches which can increase the metal content of noble metal nanostructures.