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E Wistrela, A. Bittner, M. Schneider, M. Reissner, U. Schmid:
"Magnetic and Microstructural Properties of Sputter Deposited Cr-doped Aluminium Nitride Thin Films on Silicon Substrates";
Journal of Applied Physics, 121 (2017), 1153021 - 1153027.

In this paper, we report on the microstructural and magnetic properties of CrxAl1 xN thin films
with Cr concentrations ranging up to x¼(8.560.5) at. %. The thin films are sputter deposited on
silicon substrates and exhibit a wurtzite type microstructure verified by X-ray diffraction measurements.
A vibrating sample magnetometer based measurement equipment is used to investigate
magnetic properties of the Cr doped thin films in a temperature range of T¼10 K-300 K, revealing
a paramagnetic behavior. With increasing temperature, the temperature independent diamagnetic
contribution of the substrate material dominates the overall response characteristics. No room
temperature ferromagnetism is observed for all samples investigated.

In this paper, we report on the microstructural and magnetic properties of CrxAl1 xN thin films
with Cr concentrations ranging up to x¼(8.560.5) at. %. The thin films are sputter deposited on
silicon substrates and exhibit a wurtzite type microstructure verified by X-ray diffraction measurements.
A vibrating sample magnetometer based measurement equipment is used to investigate
magnetic properties of the Cr doped thin films in a temperature range of T¼10 K-300 K, revealing
a paramagnetic behavior. With increasing temperature, the temperature independent diamagnetic
contribution of the substrate material dominates the overall response characteristics. No room
temperature ferromagnetism is observed for all samples investigated.

http://dx.doi.org/10.1063/1.4978748