[Zurück]

D. Mueller, C. Knoll, P. Weinberger, J. Ofner, R. Bittner, B. Lendl, H. Hoffmann:
"Methods for producing noble metal-modified silicon nanowires, gold-modified nanowires, and their use as SERS substrates";
Patent: PCT, Nr. Wo 2018/204963 A1; eingereicht: 15.11.2018, erteilt: 15.01.2020.

Methods for producing noble metal-modified silicon nanowires entailing creating the silicon nanowires in a silicon wafer
by means of silver-catalyzed chem. wet etching; and applying one or more noble metals to the surface of the nanowires
are described in which silicon nanowires coated with gold are produced by first creating the silicon nanowires in the
silicon wafer by means of silver-catalyzed chem. wet etching with an etching soln., the concn. and the dwell time of the
etching soln. being coordinated with each other so that nanowires with a length <15 mm are formed; and then coating the
created nanowires with gold as the noble metal by sputtering, the duration of the sputter coating being selected so that a
gold coat with a thickness between 20 nm and 130 nm is formed. Gold-modified silicon nanowires are described which
are obtained using a method as described above, are <15 mm long, and have a gold coating with a thickness in the 20-
120 nm range. The use of the nanowires as SERS substrates is also described.

https://publik.tuwien.ac.at/files/publik_277832.pdf