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J. Sama, G. Domènech-Gil, I. Gracia, X. Borrise, C. Cane, S. Barth, F. Steib, M. Waag, J. Prades, A. Romano-Rodriguez:
"Electron Beam Lithography for contacting single nanowires on non-flat suspended substrates";
Sensors and Actuators B: Chemical, 19 (2019), 616 - 623.

A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate´s topology, requiring specific holders and conditions. The methodology is demonstrated on individual SnO₂ nanowires, which, after fabrication, have been characterized as functional resistive gas nanosensors towards NH₃ and benchmarked against similar devices fabricated using more conventional Dual Beam Focused Ion Beam techniques, demonstrating the superior properties of the here presented methodology, which can be further extended to other nonconventional suspended substrates and nanomaterials.

Gas sensor, Individual nanowire, Metal oxide, EBL fabrication, Microhotplates

http://dx.doi.org/10.1016/j.snb.2019.01.040