[Zurück]

P Schmid, F. Triendl, C Zarfl, S. Schwarz, W. Artner, M. Schneider, U. Schmid:
"Electro-mechanical Properties of Multilayered Aluminum Nitride and Platinum Thin Films at High Temperatures";
Sensors and Actuators A: Physical, 293 (2019), S. 1 - 8.

tIn this study, the electro-mechanical properties of multilayered thin films consisting of 10 bi-layers of7 nm aluminum nitride (AlN) and 3 nm platinum (Pt) are investigated in the as deposited state and afterdifferent post deposition annealing steps. The multilayers are deposited using direct current magnetronsputtering on thermally oxidized silicon wafers or sapphire substrates and are annealed in Ar atmo-sphere at 800, 900 and 1000◦C up to 24 h. The electro-mechanical properties are characterized fromroom temperature up to 500◦C using Van-der-Pauw as well as gauge factor measurements. Further-more, transmission electron microscopy and energy dispersive X-ray analyses are used to investigatethe microstructure and the chemical composition of the multilayers before and after thermal loading.The influence of the annealing on the crystalline structure is examined by X-ray diffraction analyses.Annealing in this high temperature range causes an intermixture of the individual Pt and AlN sub-layersas well as a recrystallization of the Pt thin films. Annealing the multilayered thin film system at 900◦C for1 h in Argon atmosphere results in a multilayer which is electrically stable up to 500◦C in air and whichexhibits a 3 times lower temperature coefficient of resistance at a similar gauge factor when comparedto pure Pt thin films.

http://dx.doi.org/10.1016/j.sna.2019.04.036