[Zurück]


Zeitschriftenartikel:

S. Caneva, R. Weatherup, B. C. Bayer, B. Brennan, S. Spencer, K. Mingard, A. Cabrero-Vilatela, C. Baehtz, A. Pollard, S. Hofmann:
"Nucleation Control for Large, Single Crystalline Domains of Monolayer Hexagonal Boron Nitride via Si-Doped Fe Catalysts";
Nano Letters, 15 (2015), 3; S. 1867 - 1875.



Kurzfassung deutsch:
The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of ∼0.3 mm, and of continuous h-BN monolayer films with large domain sizes (>25 μm) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-film Fe/SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes a basis for further rational catalyst design for compound 2D materials.


"Offizielle" elektronische Version der Publikation (entsprechend ihrem Digital Object Identifier - DOI)
http://dx.doi.org/10.1021/nl5046632


Erstellt aus der Publikationsdatenbank der Technischen Universitšt Wien.